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Thursday, September 12, 2013

Page Parkes Talent Featured in Vogue New Exposure Contest!

How excited are we at Page Parkes to see finalist Photographer Collin Kelly representing his inspiring work at the Vogue/Bottega Veneta New Exposure contest during NYFW?! 


A panel of judges had voted to reveal the top 10 finalists of this contest. After these contenders were announced, they were given a photography project to present to the judges in hopes of winning the New Exposure grand prize.

The New Exposure judges panel included:

Thomas Maier
Vogue Photography Director Ivan Shaw
Model/actress Linda Evangelista
Curator for the Metropolitan Museum of Art’s Costume Institute Andrew Bolton
Photographer Craig McDean
Photographer Collier Schorr
Stylist Carlyne Cerf de Dudzeele
Makeup artist Pat McGrath
Hairstylist Guido Palau
Art+Commerce founding partner Jimmy Moffat
Gallerist Yossi Milo


Together, him and Stylist Leslie Rivas and MUA Bianca Linette collaborated in creating stunning, haunting photos of Model Kelsie Moody. Good luck Collin! Thanks for representing PP in the Big Apple!


Check out photos from the event!








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